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Update on main chain scission resists in Zeon for high-NA EUV lithography

dc.contributor.authorAkihide, Shirotori
dc.contributor.authorOda, Yuji
dc.contributor.authorTaguchi, Kazunori
dc.contributor.authorYeh, Sin Fu
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSanuki, Hideaki
dc.date.accessioned2024-03-04T14:25:50Z
dc.date.available2024-01-13T17:47:51Z
dc.date.available2024-03-04T14:25:50Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001125089900029
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43410.2
dc.sourceWOS
dc.titleUpdate on main chain scission resists in Zeon for high-NA EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorYeh, Sin Fu
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorAkihide, Shirotori
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecVandenberghe, Geert::0009-0001-2424-1322
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2686602
dc.identifier.eisbn978-1-5106-6749-5
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12750
imec.availabilityPublished - imec


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220.500.12860/43410.2*2024-03-04T14:24:19Zvalidation by library/open access desk
120.500.12860/434102024-01-13T17:47:51Z

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