dc.contributor.author | Lee, Inhwan | |
dc.contributor.author | Franke, Joern-Holger | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Hendrickx, Eric | |
dc.date.accessioned | 2024-03-25T10:17:42Z | |
dc.date.available | 2024-02-27T17:42:53Z | |
dc.date.available | 2024-03-25T10:17:42Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:001134890300006 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43598.2 | |
dc.source | WOS | |
dc.title | Hyper NA EUV lithography: an imaging perspective | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lee, Inhwan | |
dc.contributor.imecauthor | Franke, Joern-Holger | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.orcidimec | Lee, Inhwan::0000-0002-3283-5075 | |
dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.contributor.orcidimec | Hendrickx, Eric::0000-0003-2516-0417 | |
dc.identifier.doi | 10.1117/1.JMM.22.4.043202 | |
dc.source.numberofpages | 16 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 043202 | |
dc.source.endpage | N/A | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 4 | |
dc.source.volume | 22 | |
imec.availability | Published - imec | |