Scalable Patterning Modules for Diffractive Optics on 300 mm Substrates

Abstract

Nano-Imprint lithography (NIL) is a powerful technology for low-cost, large area patterning of complex nano-features, including surface relief gratings and meta-structures for AR optical components. A full layer patterning module that includes a NIL process suited for mass manufacturing requires multiple capabilities: nano-imprint tools, materials, template fabrication, potentially pre- or post-imprint material deposition or removal and extensive metrology. Through its longstanding history in the semiconductor industry, imec has developed advanced mastering, deposition, and etch capabilities that can be paired with NIL process development for fully integrated patterning. In this talk, recent developments in integrated surface relief patterning on transparent 300 mm substrates will be presented. Because the fabrication itself is substrate agnostic, this capability can be transferred to other substrate material available at 300 mm to match the design requirements of a variety of diffractive optical components, such as refractive index tuning.