dc.contributor.author | Ashby, Tom | |
dc.contributor.author | Truffert, Vincent | |
dc.contributor.author | Cerbu, Dorin | |
dc.contributor.author | Ausschnitt, Kit | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Verachtert, Wilfried | |
dc.contributor.author | Wuyts, Roel | |
dc.date.accessioned | 2024-09-30T11:53:23Z | |
dc.date.available | 2024-03-26T17:00:55Z | |
dc.date.available | 2024-09-30T11:53:23Z | |
dc.date.issued | 2024 | |
dc.identifier.issn | 0894-6507 | |
dc.identifier.other | WOS:001167553100004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43735.2 | |
dc.source | WOS | |
dc.title | Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical Properties | |
dc.type | Journal article | |
dc.contributor.imecauthor | Truffert, Vincent | |
dc.contributor.imecauthor | Cerbu, Dorin | |
dc.contributor.imecauthor | Ausschnitt, Kit | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Verachtert, Wilfried | |
dc.contributor.imecauthor | Wuyts, Roel | |
dc.contributor.imecauthor | Ashby, Tom | |
dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.contributor.orcidimec | Wuyts, Roel::0000-0003-4236-995X | |
dc.contributor.orcidimec | Ashby, Tom::0000-0002-9259-6475 | |
dc.date.embargo | 2023-12-05 | |
dc.identifier.doi | 10.1109/TSM.2023.3339330 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 46 | |
dc.source.endpage | 58 | |
dc.source.journal | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | |
dc.source.issue | 1 | |
dc.source.volume | 37 | |
imec.availability | Published - open access | |
dc.description.wosFundingText | No Statement Available | |