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Guiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal Dichalcogenides

dc.contributor.authorVoronenkov, Vladislav
dc.contributor.authorGroven, Benjamin
dc.contributor.authorMedina Silva, Henry
dc.contributor.authorMorin, Pierre
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2024-09-25T09:20:59Z
dc.date.available2024-03-27T17:34:16Z
dc.date.available2024-09-25T09:20:59Z
dc.date.issued2024
dc.identifier.issn1862-6300
dc.identifier.otherWOS:001181099700001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43736.2
dc.sourceWOS
dc.titleGuiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal Dichalcogenides
dc.typeJournal article
dc.contributor.imecauthorVoronenkov, Vladislav
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorMorin, Pierre
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMedina Silva, Henry
dc.contributor.orcidimecVoronenkov, Vladislav::0000-0001-6028-6678
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMorin, Pierre::0000-0002-4637-496X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMedina Silva, Henry::0000-0003-1461-5703
dc.identifier.doi10.1002/pssa.202300943
dc.source.numberofpages14
dc.source.peerreviewyes
dc.source.beginpageArt. 2300943
dc.source.endpageN/A
dc.source.journalPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
dc.source.issue9
dc.source.volume221
imec.availabilityPublished - imec
dc.description.wosFundingTextThe authors gratefully acknowledge the funding from the imec IIAP core CMOS programs and the European Union's Graphene Flagship grant agreement no. 952792.


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220.500.12860/43736.2*2024-09-25T09:19:08Zvalidation by library/open access desk
120.500.12860/437362024-03-27T17:34:16Z

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