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Applications of in-line oxygen monitoring to a rapid thermal processing tool: diagnosing gas flow dynamics and silicidation processes

dc.contributor.authorKondoh, Eiichi
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T13:11:06Z
dc.date.available2021-10-14T13:11:06Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4491
dc.sourceIIOimport
dc.titleApplications of in-line oxygen monitoring to a rapid thermal processing tool: diagnosing gas flow dynamics and silicidation processes
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage341
dc.source.endpage348
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.issue4
dc.source.volume2
imec.availabilityPublished - imec


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