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Actinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source

dc.contributor.authorDorney, Kevin
dc.contributor.authorHolzmeier, Fabian
dc.contributor.authorKissoon, Nicola N.
dc.contributor.authorWitting Larsen, Esben
dc.contributor.authorSingh, Dhirendra
dc.contributor.authorArvind, Shikhar
dc.contributor.authorSantra, Sayantani
dc.contributor.authorFallica, Roberto
dc.contributor.authorTimmermans, Marina Y.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorMakhotkin, Igor A.
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorFleischmann, Claudia
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorPetersen, John
dc.date.accessioned2025-08-05T07:36:36Z
dc.date.available2025-01-09T17:22:32Z
dc.date.available2025-08-05T07:36:36Z
dc.date.issued2024
dc.identifier.issn1932-5150
dc.identifier.otherWOS:001389147600018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45052.2
dc.sourceWOS
dc.titleActinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source
dc.typeJournal article
dc.contributor.imecauthorHolzmeier, Fabian
dc.contributor.imecauthorArvind, Shikhar
dc.contributor.imecauthorSantra, Sayantani
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorTimmermans, Marina Y.
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorDorney, Kevin
dc.contributor.imecauthorWitting Larsen, Esben
dc.contributor.imecauthorSingh, Dhirendra
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorPetersen, John
dc.contributor.orcidimecHolzmeier, Fabian::0000-0001-8749-5330
dc.contributor.orcidimecArvind, Shikhar::0000-0002-4748-7763
dc.contributor.orcidimecSantra, Sayantani::0000-0002-0119-5255
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecDorney, Kevin::0000-0003-2097-6994
dc.contributor.orcidimecWitting Larsen, Esben::0000-0002-6294-0896
dc.contributor.orcidimecSingh, Dhirendra::0000-0002-8855-0597
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.contributor.orcidimecPetersen, John::0000-0003-4815-3770
dc.identifier.doi10.1117/1.JMM.23.4.041406
dc.source.numberofpages15
dc.source.peerreviewyes
dc.source.beginpageArt. 041406
dc.source.endpageN/A
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.issue4
dc.source.volume23
imec.availabilityPublished - imec
dc.description.wosFundingTextThis project (Grant No. 20IND04 ATMOC) received funding from the EMPIR program co-financed by the Participating States and from the European Union's Horizon 2020 research and innovation program. K.M.D and D.P.S. acknowledge funding from the European Union's Horizon 2020 research and innovation program under the Marie Sklodowska-Curie grant agreement [Grant Nos.101031245 (K.M.D.) and 101032241 (D.P.S.)]. We graciously acknowledge FujiFilm for providing the model ESCAP material used in this work. A portion of this work was presented at the SPIE Advanced Lithography + Patterning Conference, Optical and EUV Lithography XXXVI, 2023 (Proceeding 1249407).29


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220.500.12860/45052.2*2025-08-05T07:29:39Zvalidation by library/open access desk
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