dc.contributor.author | Pacco, Antoine | |
dc.contributor.author | Nakano, Teppei | |
dc.contributor.author | Loyo Prado, Jana | |
dc.contributor.author | Lai, Ju-Geng | |
dc.contributor.author | Kawarazaki, Hikaru | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.date.accessioned | 2025-07-31T09:41:46Z | |
dc.date.available | 2025-01-16T18:30:51Z | |
dc.date.available | 2025-07-31T09:41:46Z | |
dc.date.issued | 2025 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.other | WOS:001392636300001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45085.2 | |
dc.source | WOS | |
dc.title | Etching of tungsten via a combination of thermal oxide formation and wet-chemical oxide dissolution | |
dc.type | Journal article | |
dc.contributor.imecauthor | Pacco, Antoine | |
dc.contributor.imecauthor | Lai, Ju-Geng | |
dc.contributor.imecauthor | Loyo Prado, Jana | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.orcidimec | Pacco, Antoine::0000-0001-6330-5053 | |
dc.contributor.orcidimec | Loyo Prado, Jana::0009-0000-8595-0918 | |
dc.contributor.orcidimec | Altamirano Sanchez, Efrain::0000-0003-3235-6055 | |
dc.identifier.doi | 10.1016/j.mee.2024.112304 | |
dc.source.numberofpages | 6 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 112304 | |
dc.source.endpage | N/A | |
dc.source.journal | MICROELECTRONIC ENGINEERING | |
dc.source.issue | 1 March | |
dc.source.volume | 297 | |
imec.availability | Published - imec | |