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Interaction of Ti capped Co thin film with Si3N4

dc.contributor.authorLi, Hua
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorMaex, Karen
dc.contributor.authorGutakovskii, A.
dc.contributor.authorVan Landuyt, J.
dc.contributor.authorFroyen, L.
dc.date.accessioned2021-10-14T13:15:42Z
dc.date.available2021-10-14T13:15:42Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4527
dc.sourceIIOimport
dc.titleInteraction of Ti capped Co thin film with Si3N4
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage4307
dc.source.endpage9
dc.source.journalApplied Physics Letters
dc.source.issue26
dc.source.volume77
imec.availabilityPublished - open access


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