Single-wafer wet cleaning improved by novel high-performance wafer drying

dc.contributor.author	Mertens, Paul
dc.contributor.author	Marent, Katrien
dc.date.accessioned	2021-10-14T13:22:44Z
dc.date.available	2021-10-14T13:22:44Z
dc.date.issued	2000
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/4581
dc.source	IIOimport
dc.title	Single-wafer wet cleaning improved by novel high-performance wafer drying
dc.type	Journal article
dc.contributor.imecauthor	Mertens, Paul
dc.contributor.imecauthor	Marent, Katrien
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	113
dc.source.journal	Solid State Technology
dc.source.issue	9
dc.source.volume	43
imec.availability	Published - open access