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Characterization of silicon oxynitride films by grazing-emission X-ray fluorescence spectrometry

dc.contributor.authorMonaghan, M. L.
dc.contributor.authorNigam, Tanya
dc.contributor.authorHoussa, Michel
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorUrbach, H. P.
dc.contributor.authorDe Bokx, P. K.
dc.date.accessioned2021-10-14T13:24:27Z
dc.date.available2021-10-14T13:24:27Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4593
dc.sourceIIOimport
dc.titleCharacterization of silicon oxynitride films by grazing-emission X-ray fluorescence spectrometry
dc.typeJournal article
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage197
dc.source.endpage202
dc.source.journalThin Solid Films
dc.source.issue2
dc.source.volume359
imec.availabilityPublished - imec


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