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Applying a thin imaging resist system to substrates with topography

dc.contributor.authorNeisser, M.
dc.contributor.authorGrosev, G.
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorLepage, Muriel
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-14T13:26:48Z
dc.date.available2021-10-14T13:26:48Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4610
dc.sourceIIOimport
dc.titleApplying a thin imaging resist system to substrates with topography
dc.typeJournal article
dc.contributor.imecauthorStruyf, Herbert
dc.source.peerreviewno
dc.source.beginpage127
dc.source.journalSolid State Technology
dc.source.issue8
dc.source.volume43
imec.availabilityPublished - imec


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