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Microtexture and electromigration-induced drift in electroplated damascene Cu

dc.contributor.authorProost, Joris
dc.contributor.authorHirato, T.
dc.contributor.authorFuruhara, T.
dc.contributor.authorMaex, Karen
dc.contributor.authorCelis, Jean-Pierre
dc.date.accessioned2021-10-14T13:36:56Z
dc.date.available2021-10-14T13:36:56Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4679
dc.sourceIIOimport
dc.titleMicrotexture and electromigration-induced drift in electroplated damascene Cu
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2792
dc.source.endpage2802
dc.source.journalJournal of Applied Physics
dc.source.issue6
dc.source.volume87
imec.availabilityPublished - open access


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