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Electromigration-induced drift in damascene and plasma-etched Al(Cu). II: Mass transport mechanisms in bamboo interconnects

dc.contributor.authorProost, Joris
dc.contributor.authorMaex, Karen
dc.contributor.authorDelaey, L.
dc.date.accessioned2021-10-14T13:37:05Z
dc.date.available2021-10-14T13:37:05Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4680
dc.sourceIIOimport
dc.titleElectromigration-induced drift in damascene and plasma-etched Al(Cu). II: Mass transport mechanisms in bamboo interconnects
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage99
dc.source.endpage109
dc.source.journalJournal of Applied Physics
dc.source.issue1
dc.source.volume87
imec.availabilityPublished - open access


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