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Quantitative analysis of trace metals in silicon nitride films by a vapor phase decomposition/solution collection approach

dc.contributor.authorVereecke, Guy
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVerstraete, Kurt
dc.contributor.authorArnauts, Sophia
dc.contributor.authorHeyns, Marc
dc.contributor.authorPlante, W.
dc.date.accessioned2021-10-14T14:13:48Z
dc.date.available2021-10-14T14:13:48Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4910
dc.sourceIIOimport
dc.titleQuantitative analysis of trace metals in silicon nitride films by a vapor phase decomposition/solution collection approach
dc.typeJournal article
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage1499
dc.source.endpage1501
dc.source.journalJournal of the Electrochemical Society
dc.source.issue4
dc.source.volume147
imec.availabilityPublished - imec


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