Browsing Articles by imec author "8ab57f628a3c49cc593b0c8d4c597f33636ce0e4"
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Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010) -
New lithographic requirements for the implant levels in scaled devices
Vandeweyer, Tom; Baerts, Christina; Horiguchi, Naoto; Ercken, Monique (2011) -
Sub-50nm gate patterning using line-trimming with 248nm or 193nm litho
Pollentier, Ivan; Jaenen, Patrick; Baerts, Christina; Ronse, Kurt (2002)