Browsing Articles by imec author "bc3cb474dd21d65228e64d93fa04290a9e1a3b37"
Now showing items 1-5 of 5
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Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Fallica, Roberto; Chen, Steven; De Simone, Danilo; Suh, Hyo Seon (2022) -
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish; Pollentier, Ivan; Singh, Harpreet; Fallica, Roberto; De Simone, Danilo; De Gendt, Stefan (2020) -
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Fallica, Roberto; Nannarone, Stefano; Mahne, Nicola; Malvezzi, Andrea Marco; Berti, Andrea; De Simone, Danilo (2021) -
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Fallica, Roberto; Mahne, Nicola; Conard, Thierry; Vanleenhove, Anja; de Simone, Danilo; Nannarone, Stefano (2023) -
Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography
Fallica, Roberto; De Simone, Danilo; Chen, Steven; Safdar, Muhammad; Suh, Hyo Seon (2022)