Characterisation of porous low dielectric constant films by ellipsometric porosimetry

dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	Mogilnikov, K. P.
dc.date.accessioned	2021-10-14T16:36:37Z
dc.date.available	2021-10-14T16:36:37Z
dc.date.issued	2001
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/5035
dc.source	IIOimport
dc.title	Characterisation of porous low dielectric constant films by ellipsometric porosimetry
dc.type	Journal article
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	219
dc.source.endpage	221
dc.source.journal	Semiconductor Fabtech
dc.source.volume	14
imec.availability	Published - open access