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Recent progress in ArF lithography for the 100nm node

dc.contributor.authorGoethals, Mieke
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorPollentier, Ivan
dc.contributor.authorErcken, Monique
dc.contributor.authorBisschop, P.
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T16:58:46Z
dc.date.available2021-10-14T16:58:46Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5317
dc.sourceIIOimport
dc.titleRecent progress in ArF lithography for the 100nm node
dc.typeJournal article
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage333
dc.source.endpage340
dc.source.journalJ. Photopolymer Science and Technology
dc.source.issue3
dc.source.volume14
imec.availabilityPublished - imec
imec.internalnotesPresented at the 18th Conference on Photopolymer Science and Technology; June 2001; Chiba, Japan


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