dc.contributor.author | Bracher, B. H. | |
dc.contributor.author | Jonckheere, Rik | |
dc.date.accessioned | 2021-09-29T13:04:23Z | |
dc.date.available | 2021-09-29T13:04:23Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/541 | |
dc.source | IIOimport | |
dc.title | Profile analysis and the isofocal threshold in SEM metrology | |
dc.type | Journal article | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.source.peerreview | no | |
dc.source.beginpage | 531 | |
dc.source.endpage | 4 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 1_4 | |
dc.source.volume | 27 | |
imec.availability | Published - imec | |
imec.internalnotes | Micro- and Nanoengineering 94. International Conference on Micro- and Nanofabrication. 26-29 Sept. 1994; Davos, Switzerland | |