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dc.contributor.authorBracher, B. H.
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-09-29T13:04:23Z
dc.date.available2021-09-29T13:04:23Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/541
dc.sourceIIOimport
dc.titleProfile analysis and the isofocal threshold in SEM metrology
dc.typeJournal article
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage531
dc.source.endpage4
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume27
imec.availabilityPublished - imec
imec.internalnotesMicro- and Nanoengineering 94. International Conference on Micro- and Nanofabrication. 26-29 Sept. 1994; Davos, Switzerland


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