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248nm and 193nm lithography for damascene patterning

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorPollentier, Ivan
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T17:18:13Z
dc.date.available2021-10-14T17:18:13Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5462
dc.sourceIIOimport
dc.title248nm and 193nm lithography for damascene patterning
dc.typeJournal article
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpageS15,S17,S19,S21
dc.source.endpageS22
dc.source.journalSolid State Technology
dc.source.issue4
dc.source.volume44
imec.availabilityPublished - imec


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