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The impact of airborne molecular bases on DUV photoresists

dc.contributor.authorRuede, D.
dc.contributor.authorErcken, Monique
dc.contributor.authorBorgers, Tom
dc.date.accessioned2021-10-14T17:44:35Z
dc.date.available2021-10-14T17:44:35Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5626
dc.sourceIIOimport
dc.titleThe impact of airborne molecular bases on DUV photoresists
dc.typeJournal article
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorBorgers, Tom
dc.contributor.orcidimecBorgers, Tom::0000-0002-7878-6977
dc.source.peerreviewno
dc.source.beginpage63
dc.source.endpage70
dc.source.journalSolid State Technology
dc.source.issue8
dc.source.volume44
imec.availabilityPublished - imec


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