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Characterization of the Mechanical Stress induced during Silicidation in sub-0.25μm MOS Technologies

dc.contributor.authorSteegen, An
dc.date.accessioned2021-10-14T17:52:53Z
dc.date.available2021-10-14T17:52:53Z
dc.date.issued2001-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5673
dc.sourceIIOimport
dc.titleCharacterization of the Mechanical Stress induced during Silicidation in sub-0.25μm MOS Technologies
dc.typePHD thesis
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.contributor.thesisadvisorMaex, Karen
dc.contributor.thesisadvisorVan Houtte, Paul
imec.availabilityPublished - imec


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