Show simple item record

The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures

dc.contributor.authorStuer, Cindy
dc.contributor.authorVan Landuyt, J.
dc.contributor.authorBender, Hugo
dc.contributor.authorRooyackers, Rita
dc.contributor.authorBadenes, Gonçal
dc.date.accessioned2021-10-14T17:55:47Z
dc.date.available2021-10-14T17:55:47Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5689
dc.sourceIIOimport
dc.titleThe use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.beginpage117
dc.source.endpage119
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.issue1_3
dc.source.volume4
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record