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ArF lithography options for 100nm technologies

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorKim, Young-Chang
dc.contributor.authorDelvaux, Christie
dc.contributor.authorLucas, Kevin
dc.contributor.authorChoi, Sang-Jun
dc.contributor.authorErcken, Monique
dc.contributor.authorRonse, Kurt
dc.contributor.authorVleeming, Bert
dc.date.accessioned2021-10-14T18:10:33Z
dc.date.available2021-10-14T18:10:33Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5768
dc.sourceIIOimport
dc.titleArF lithography options for 100nm technologies
dc.typeJournal article
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage157
dc.source.endpage165
dc.source.journalSemiconductor Fabtech
dc.source.volume14
imec.availabilityPublished - open access


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