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CD control for two-dimensional features in future technology nodes

dc.contributor.authorVerhaegen, Staf
dc.contributor.authorGordon, R.
dc.contributor.authorJonckheere, Rik
dc.contributor.authorMcCallum, M.
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T18:18:40Z
dc.date.available2021-10-14T18:18:40Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5809
dc.sourceIIOimport
dc.titleCD control for two-dimensional features in future technology nodes
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage368
dc.source.endpage378
dc.source.conferenceOptical Microlithography XIV
dc.source.conferencedate27/02/2001
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4346


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