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Metrology method for the correlation of line edge roughness for different resists before and after etch

dc.contributor.authorWinkelmeier, Stephanie
dc.contributor.authorSarstedt, Margit
dc.contributor.authorErcken, Monique
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T18:24:39Z
dc.date.available2021-10-14T18:24:39Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5838
dc.sourceIIOimport
dc.titleMetrology method for the correlation of line edge roughness for different resists before and after etch
dc.typeJournal article
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage665
dc.source.endpage672
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume57-58
imec.availabilityPublished - imec


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