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In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction

dc.contributor.authorZhao, Chao
dc.contributor.authorRoebben, G.
dc.contributor.authorBender, Hugo
dc.contributor.authorYoung, Edward
dc.contributor.authorHaukka, S.
dc.contributor.authorHoussa, Michel
dc.contributor.authorNaili, Mohamed
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVan der Biest, O.
dc.date.accessioned2021-10-14T18:33:02Z
dc.date.available2021-10-14T18:33:02Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5878
dc.sourceIIOimport
dc.titleIn situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage995
dc.source.endpage998
dc.source.journalMicroelectronics Reliability
dc.source.issue7
dc.source.volume41
imec.availabilityPublished - imec


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