Browsing Presentations by author "Tallarida, Massimo"
Now showing items 1-2 of 2
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In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS
Rodriguez, Leonard; De Clercq, Astrid; Tallarida, Massimo; Cuypers, Daniel; Locquet, Jean-Pierre; Van Elshocht, Sven; Adelmann, Christoph; Caymax, Matty (2012) -
Interface chemistry of Al2O3/III-V upon atomic layer deposition
Tallarida, Massimo; Adelmann, Christoph; Cuypers, Daniel; Rodriguez, Leonard; Lin, Dennis; Michling, Marcel; Friedrich, Daniel; De Clercq, Astrid; Delabie, Annelies; Van Elshocht, Sven; Locquet, Jean-Pierre; Caymax, Matty; Schmeisser, Dieter (2012)