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Scanning spreading resistance microscopy and spectroscopy for routine and quantitative two-dimensional carrier profiling

dc.contributor.authorEyben, Pierre
dc.contributor.authorXu, Mingwei
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorClarysse, Trudo
dc.contributor.authorCallewaert, Sven
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T21:36:47Z
dc.date.available2021-10-14T21:36:47Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6318
dc.sourceIIOimport
dc.titleScanning spreading resistance microscopy and spectroscopy for routine and quantitative two-dimensional carrier profiling
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage471
dc.source.endpage478
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.issue1
dc.source.volume20
imec.availabilityPublished - imec
imec.internalnotes6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semiconductors. April 2001; Napa Valley, CA, USA


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