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Properties of porous HSQ-based films capped by plasma enhanced chemical vapor deposition dielectric layers

dc.contributor.authorIacopi, Francesca
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorSleeckx, Erik
dc.contributor.authorConrad, T.
dc.contributor.authorBender, Hugo
dc.contributor.authorMeynen, Herman
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T21:51:45Z
dc.date.available2021-10-14T21:51:45Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6417
dc.sourceIIOimport
dc.titleProperties of porous HSQ-based films capped by plasma enhanced chemical vapor deposition dielectric layers
dc.typeJournal article
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.source.peerreviewno
dc.source.beginpage109
dc.source.endpage115
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.issue1
dc.source.volume20
imec.availabilityPublished - imec


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