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The role of H in the Cu+ drift diffusion in plasma-deposited a- SiC : H

dc.contributor.authorLanckmans, Filip
dc.contributor.authorBrijs, Bert
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T22:08:03Z
dc.date.available2021-10-14T22:08:03Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6514
dc.sourceIIOimport
dc.titleThe role of H in the Cu+ drift diffusion in plasma-deposited a- SiC : H
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage3565
dc.source.endpage3574
dc.source.journalJournal of Physics-Condensed Matter
dc.source.issue13
dc.source.volume14
imec.availabilityPublished - imec


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