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Use of a capacitance voltage technique to study copper drift diffusion in (porous) inorganic low-k Materials

dc.contributor.authorLanckmans, Filip
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T22:08:24Z
dc.date.available2021-10-14T22:08:24Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6516
dc.sourceIIOimport
dc.titleUse of a capacitance voltage technique to study copper drift diffusion in (porous) inorganic low-k Materials
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage125
dc.source.endpage132
dc.source.journalMicroelectronic Engineering
dc.source.issue1_2
dc.source.volume60
imec.availabilityPublished - imec
imec.internalnotes5th Workshop on Materials for Advanced Metallization. March 2001; Sigtuna, Sweden


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