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Effect of implant oxide on ultra-shallow junction formation

dc.contributor.authorLindsay, Richard
dc.contributor.authorLauwers, Anne
dc.contributor.authorFruehauf, Jens
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T22:12:26Z
dc.date.available2021-10-14T22:12:26Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6539
dc.sourceIIOimport
dc.titleEffect of implant oxide on ultra-shallow junction formation
dc.typeJournal article
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage2225
dc.source.endpage2228
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.issue6
dc.source.volume20
imec.availabilityPublished - imec


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