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Sub-100nm technologies drive single-wafer wet cleaning

dc.contributor.authorMertens, Paul
dc.contributor.authorParton, Els
dc.date.accessioned2021-10-14T22:23:42Z
dc.date.available2021-10-14T22:23:42Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6600
dc.sourceIIOimport
dc.titleSub-100nm technologies drive single-wafer wet cleaning
dc.typeJournal article
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorParton, Els
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage51
dc.source.endpage54
dc.source.journalSolid State Technology
dc.source.issue2
dc.source.volume45
imec.availabilityPublished - open access


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