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Back-end, low-k dielectric compatible resist rework procedure

dc.contributor.authorReybrouck, Mario
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-14T22:54:56Z
dc.date.available2021-10-14T22:54:56Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6755
dc.sourceIIOimport
dc.titleBack-end, low-k dielectric compatible resist rework procedure
dc.typeOral presentation
dc.contributor.imecauthorReybrouck, Mario
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference39th Interface Symposium
dc.source.conferencedate22/09/2002
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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