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High-resolution patterning of semiconductors using electron-beam-assisted wet etching

dc.contributor.authorRichter, G.
dc.contributor.authorSchmidt, G.
dc.contributor.authorMolenkamp, L.W.
dc.contributor.authorBibus, M.
dc.contributor.authorDe Boeck, Jo
dc.date.accessioned2021-10-14T22:55:35Z
dc.date.available2021-10-14T22:55:35Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6758
dc.sourceIIOimport
dc.titleHigh-resolution patterning of semiconductors using electron-beam-assisted wet etching
dc.typeJournal article
dc.contributor.imecauthorDe Boeck, Jo
dc.source.peerreviewno
dc.source.beginpage1693
dc.source.endpage1695
dc.source.journalApplied Physics Letters
dc.source.issue9
dc.source.volume81
imec.availabilityPublished - imec


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