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The IMEC-Clean: A new, highly efficient cleaning and drying technique for Si wafers

dc.contributor.authorHeyns, Marc
dc.contributor.authorMaex, Karen
dc.contributor.authorSchild, R.
dc.date.accessioned2021-09-29T13:07:20Z
dc.date.available2021-09-29T13:07:20Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/676
dc.sourceIIOimport
dc.titleThe IMEC-Clean: A new, highly efficient cleaning and drying technique for Si wafers
dc.typeJournal article
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage213
dc.source.endpage216
dc.source.journalSemiconductor Fabtech
dc.source.volume3
imec.availabilityPublished - imec


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