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Aequeous chemical solution deposition for ferroelectric thin films

dc.contributor.authorVan Bael, M.K.
dc.contributor.authorNelis, Daniël
dc.contributor.authorHardy, A.
dc.contributor.authorMondelaers, D.
dc.contributor.authorVan Werde, K.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorVanhoyland, G.
dc.contributor.authorVan den Rul, H.
dc.contributor.authorMullens, J.
dc.contributor.authorVan Poucke, L.C.
dc.contributor.authorFrederix, Filip
dc.contributor.authorWouters, Dirk
dc.date.accessioned2021-10-14T23:26:51Z
dc.date.available2021-10-14T23:26:51Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6902
dc.sourceIIOimport
dc.titleAequeous chemical solution deposition for ferroelectric thin films
dc.typeJournal article
dc.contributor.imecauthorD'Haen, Jan
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage113
dc.source.endpage122
dc.source.journalIntegrated Ferroelectrics
dc.source.volume45
imec.availabilityPublished - open access
imec.internalnotesInternational Joint Conference on the Application of Ferroelectrics - IFFF; 28 May - 6 June 2002; Nara, Japan


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