Aequeous chemical solution deposition for ferroelectric thin films
dc.contributor.author | Van Bael, M.K. | |
dc.contributor.author | Nelis, Daniël | |
dc.contributor.author | Hardy, A. | |
dc.contributor.author | Mondelaers, D. | |
dc.contributor.author | Van Werde, K. | |
dc.contributor.author | D'Haen, Jan | |
dc.contributor.author | Vanhoyland, G. | |
dc.contributor.author | Van den Rul, H. | |
dc.contributor.author | Mullens, J. | |
dc.contributor.author | Van Poucke, L.C. | |
dc.contributor.author | Frederix, Filip | |
dc.contributor.author | Wouters, Dirk | |
dc.date.accessioned | 2021-10-14T23:26:51Z | |
dc.date.available | 2021-10-14T23:26:51Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6902 | |
dc.source | IIOimport | |
dc.title | Aequeous chemical solution deposition for ferroelectric thin films | |
dc.type | Journal article | |
dc.contributor.imecauthor | D'Haen, Jan | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 113 | |
dc.source.endpage | 122 | |
dc.source.journal | Integrated Ferroelectrics | |
dc.source.volume | 45 | |
imec.availability | Published - open access | |
imec.internalnotes | International Joint Conference on the Application of Ferroelectrics - IFFF; 28 May - 6 June 2002; Nara, Japan |