Localised strain characterisation in semiconductor structures using electron diffraction contrast imaging
dc.contributor.author | Janssens, Koenraad | |
dc.contributor.author | Van Der Biest, O. | |
dc.contributor.author | Vanhellemont, Jan | |
dc.contributor.author | Maes, Herman | |
dc.contributor.author | Hull, R. | |
dc.contributor.author | Bean, J. C. | |
dc.date.accessioned | 2021-09-29T13:07:57Z | |
dc.date.available | 2021-09-29T13:07:57Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/693 | |
dc.source | IIOimport | |
dc.title | Localised strain characterisation in semiconductor structures using electron diffraction contrast imaging | |
dc.type | Journal article | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 66 | |
dc.source.endpage | 71 | |
dc.source.journal | Materials Science and Technology | |
dc.source.issue | 1 | |
dc.source.volume | 11 | |
imec.availability | Published - open access | |
imec.internalnotes | Paper from the 1st International Conference on Materials for Microelectronics. October 17-19, 1994. Barcelona, Spain. |