dc.contributor.author | Chamirian, Oxana | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Van Dal, Mark | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T04:07:34Z | |
dc.date.available | 2021-10-15T04:07:34Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7301 | |
dc.source | IIOimport | |
dc.title | Thickness scaling issues of Ni-silicide | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.imecauthor | Van Dal, Mark | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.source.peerreview | no | |
dc.source.beginpage | 201 | |
dc.source.endpage | 208 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 2_4 | |
dc.source.volume | 70 | |
imec.availability | Published - imec | |
imec.internalnotes | Materials for Advanced Metallization 2003 | |