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Electrical characterization of low-k dielectrics and copper interconnects

dc.contributor.authorDe Roest, David
dc.date.accessioned2021-10-15T04:23:08Z
dc.date.available2021-10-15T04:23:08Z
dc.date.issued2003-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7445
dc.sourceIIOimport
dc.titleElectrical characterization of low-k dielectrics and copper interconnects
dc.typePHD thesis
dc.contributor.imecauthorDe Roest, David
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.contributor.thesisadvisorMaex, Karen
dc.contributor.thesisadvisorNauwelaers, Bart
imec.availabilityPublished - open access


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