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Progress towards a physical contact model for scanning spreading resistance microscopy

dc.contributor.authorEyben, Pierre
dc.contributor.authorDenis, Samuel
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:39:26Z
dc.date.available2021-10-15T04:39:26Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7561
dc.sourceIIOimport
dc.titleProgress towards a physical contact model for scanning spreading resistance microscopy
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage132
dc.source.endpage137
dc.source.journalMaterials Science & Engineering B
dc.source.issue1_3
dc.source.volume102
imec.availabilityPublished - imec
imec.internalnotesE-MRS 2002 Symposium E: Advanced Characterisation of Semiconductors Strasbourg, 18 June - 21 June 2002


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