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Bias-induced junction displacements in scanning spreading resistance microscopy and scanning capacitance microscopy

dc.contributor.authorEyben, Pierre
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:39:53Z
dc.date.available2021-10-15T04:39:53Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7564
dc.sourceIIOimport
dc.titleBias-induced junction displacements in scanning spreading resistance microscopy and scanning capacitance microscopy
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage737
dc.source.endpage743
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue2
dc.source.volume21
imec.availabilityPublished - imec


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