| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Hermans, Jan | |
| dc.date.accessioned | 2021-10-15T04:48:07Z | |
| dc.date.available | 2021-10-15T04:48:07Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7615 | |
| dc.source | IIOimport | |
| dc.title | Introducing 157nm full field lithography | |
| dc.type | Journal article | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Hermans, Jan | |
| dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 549 | |
| dc.source.endpage | 556 | |
| dc.source.journal | Journal of Photopolymer Science and Technology | |
| dc.source.issue | 4 | |
| dc.source.volume | 16 | |
| imec.availability | Published - open access | |
| imec.internalnotes | Keynote address 20th Conference of Photopolymer Science; Chiba, Japan; June 2003 | |
