dc.contributor.author | Leunissen, Peter | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Derksen, G.B. | |
dc.date.accessioned | 2021-10-15T05:22:56Z | |
dc.date.available | 2021-10-15T05:22:56Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7800 | |
dc.source | IIOimport | |
dc.title | Influence of gate patterning on line edge roughness | |
dc.type | Journal article | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | no | |
dc.source.beginpage | 3140 | |
dc.source.endpage | 3148 | |
dc.source.journal | Journal of Vacuum Science & Technology B | |
dc.source.issue | 6 | |
dc.source.volume | 21 | |
imec.availability | Published - imec | |
imec.internalnotes | Paper from the 47th Int. Conf. on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN; May 2003; Tampa, FL, USA | |