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Influence of gate patterning on line edge roughness

dc.contributor.authorLeunissen, Peter
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.contributor.authorDerksen, G.B.
dc.date.accessioned2021-10-15T05:22:56Z
dc.date.available2021-10-15T05:22:56Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7800
dc.sourceIIOimport
dc.titleInfluence of gate patterning on line edge roughness
dc.typeJournal article
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage3140
dc.source.endpage3148
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.issue6
dc.source.volume21
imec.availabilityPublished - imec
imec.internalnotesPaper from the 47th Int. Conf. on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN; May 2003; Tampa, FL, USA


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