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Single damascene integration of porous zirkonTM version 1 low-k dielectric films

dc.contributor.authorMalhouitre, Stéphane
dc.contributor.authorJehoul, Christiane
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorCarbonell, Laure
dc.contributor.authorVos, Ingrid
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorGronbeck, D.
dc.contributor.authorGallagher, M.
dc.contributor.authorCalvert, J.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T05:33:51Z
dc.date.available2021-10-15T05:33:51Z
dc.date.issued2003-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7852
dc.sourceIIOimport
dc.titleSingle damascene integration of porous zirkonTM version 1 low-k dielectric films
dc.typeJournal article
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.source.peerreviewno
dc.source.beginpage302
dc.source.endpage307
dc.source.journalMicroelectronic Engineering
dc.source.issue2_4
dc.source.volume70
imec.availabilityPublished - imec


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