dc.contributor.author | Malhouitre, Stéphane | |
dc.contributor.author | Jehoul, Christiane | |
dc.contributor.author | Van Aelst, Joke | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Brongersma, Sywert | |
dc.contributor.author | Carbonell, Laure | |
dc.contributor.author | Vos, Ingrid | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Van Hove, Marleen | |
dc.contributor.author | Gronbeck, D. | |
dc.contributor.author | Gallagher, M. | |
dc.contributor.author | Calvert, J. | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T05:33:51Z | |
dc.date.available | 2021-10-15T05:33:51Z | |
dc.date.issued | 2003-11 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7852 | |
dc.source | IIOimport | |
dc.title | Single damascene integration of porous zirkonTM version 1 low-k dielectric films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Jehoul, Christiane | |
dc.contributor.imecauthor | Van Aelst, Joke | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Brongersma, Sywert | |
dc.contributor.imecauthor | Vos, Ingrid | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Brongersma, Sywert::0000-0002-1755-3897 | |
dc.source.peerreview | no | |
dc.source.beginpage | 302 | |
dc.source.endpage | 307 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 2_4 | |
dc.source.volume | 70 | |
imec.availability | Published - imec | |