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Introduction of high-k materials into wet processing, analysis and behavior

dc.contributor.authorOnsia, Bart
dc.contributor.authorHellin, David
dc.contributor.authorClaes, Martine
dc.contributor.authorMaes, A.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T05:56:38Z
dc.date.available2021-10-15T05:56:38Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7957
dc.sourceIIOimport
dc.titleIntroduction of high-k materials into wet processing, analysis and behavior
dc.typeProceedings paper
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage19
dc.source.endpage23
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid-State Phenomena; Vol. 92


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