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Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis

dc.contributor.authorPatsis, G.P.
dc.contributor.authorConstantoudis, V.
dc.contributor.authorTserepi, A.
dc.contributor.authorGogolides, E.
dc.contributor.authorGrozev, Grozdan
dc.contributor.authorHoffmann, Thomas
dc.date.accessioned2021-10-15T06:03:01Z
dc.date.available2021-10-15T06:03:01Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7985
dc.sourceIIOimport
dc.titleRoughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
dc.typeJournal article
dc.contributor.imecauthorGrozev, Grozdan
dc.source.peerreviewno
dc.source.beginpage319
dc.source.endpage325
dc.source.journalMicroelectronic Engineering
dc.source.volume67-68
imec.availabilityPublished - imec


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