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A printability study for phase-shift masks at 193nm lithography

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-15T06:08:16Z
dc.date.available2021-10-15T06:08:16Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8008
dc.sourceIIOimport
dc.titleA printability study for phase-shift masks at 193nm lithography
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage67
dc.source.endpage78
dc.source.journalGMM-Fachbericht
dc.source.issue39
imec.availabilityPublished - imec
imec.internalnotesLectures held at the GMM-Conference January 13-15, 2003 in Sonthofen, Germany


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